真空紫外～X射线反射膜研究现状  

Review on Highly Reflecting Mirrors for Vacuum Ultraviolet and X-ray

作　　者：干蜀毅[1] 徐向东[1] 洪义麟[1] 刘颍[1] 付绍军[1] 

机构地区：[1]中国科技大学国家同步辐射实验室

出　　处：《真空科学与技术学报》2006年第6期459-468,共10页Chinese Journal of Vacuum Science and Technology

摘　　要：真空紫外～X射线反射膜在分子、原子结构、宇宙物理、微纳米器件、生命科学等研究领域有着极其重要的应用。本文总结了迄今为止在A〈200nm内反射膜研究的进展情况，列出了常用单层金属反射膜最佳沉积条件、反射光谱以及各自的特点；对复合膜则根据所应用的波长范围，阐述了膜材选择、膜层设计及薄膜制作过程中所涉及的一些重要问题，分析了复合膜反射率增强的机理。并给出了相应波段所用的膜材、膜对结构及所能达到的最高反射率。The latest progress of the highly reflecting mortar for vacuum ultraviolet（VUV） and X-ray with the wavelength, λ, shorter than 200 nm, was reviewed. Discussions focused on the optimum conditions for film growth of widely used metals in the mirror fabrication, their reflecting spectra and their specific characteristics. For multi-layered structures, the principles of layer material selection, film stack design and key fabrication problems were discussed according to their respective working wavelength regions. The possible mechanisms responsible for reflection enhancement of the mirrors were tentatively explained. Some metal film stacks with maximum reflectance were successfully fabricated. Potential applications of the mirror in the fields, including atomic structure analysis, cosmic physics and nano-devices and life science, were also tentatively discussed.

关 键 词：真空紫外 X射线 反射膜 反射镜 反射率 复合膜 

分 类 号：TB43[一般工业技术]