离子轰击碳膜凸起形成碳纳米尖端的理论分析  

Theoretical Analysis of Formation of Carbon Nanotips from Carbon Film Spikes by Ion Bombardment

作　　者：王必本[1] 徐幸梓[2] 张兵[1] 

机构地区：[1]北京工业大学应用数理学院,北京100022 [2]重庆大学材料科学与工程学院,重庆400044

出　　处：《河南师范大学学报（自然科学版）》2006年第4期203-208,共6页Journal of Henan Normal University(Natural Science Edition)

基　　金：教育部留学回国人员科研启动基金资助的课题

摘　　要：用CH4、NH3和H2为反应气体,利用等离子体增强热丝化学气相沉积系统在沉积有碳膜的Si上制备了碳纳米尖端.用原子力显微镜表征了碳膜,结果表明碳膜是凸凹不平的膜,有许多凸起.在生长碳纳米尖端的过程中,由于既有含碳离子在凸起上的沉积,又有氢离子和含氮离子对凸起的刻蚀,根据有关离子沉积和溅射刻蚀的理论,理论分析了离子轰击碳膜凸起碳纳米尖端的形成.Carbon nanotips were prepared from a carbon film deposited on silicon by plasma-enhanced hot filament chemical vapor deposition using CH4, NH3 and H2 as the reaction gases. The carbon film was characterized by atomic force microscopy and the result indicates that the carbon film is a rough film with a number of spikes. Because there were carbonaceous ions to deposit on the spikes as well as hydrogen and nitrogenous ions to etch them during growing the carbon nanotips, their formation from the carbon film spikes by ion bombardment was theoretically analyzed according to theory related to ion depositon and sputter-etching.

关 键 词：碳纳米尖端 离子轰击 化学气相沉积 

分 类 号：O484.1[理学—固体物理] O539[理学—物理]