聚焦离子束系统在微米/纳米加工技术中的应用  

Application of Focused Ion Beam in Micro/Nanometer Micromachining Technology

作　　者：张继成[1] 唐永建[1] 吴卫东[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,绵阳621900

出　　处：《材料导报》2006年第F11期40-43,46,共5页Materials Reports

基　　金：中国工程物理研究院基金资助课题(课题编号:0344020)

摘　　要：聚焦离子束系统是微细加工和分析的主要技术之一,是一个完美的微米/纳米技术研究平台。简述了聚焦离子束系统的组成和主要功能,着重介绍了近年来该技术在离子束刻蚀、反应离子束刻蚀、离子束辅助沉积、离子注入、微区分析、掺杂和成像以及无掩膜曝光等微米/纳米加工领域的应用,并对未来的发展前景进行了简要分析。The application of focused ion beam（FIB）technology in microfabrication has become increasngly popular. Its use in microfabrication has advantages over other micromachining technologies, such as small feature resolution,the ability to process without masks and being accommodating for variety of materials and geometries. In this paper, the application of FIB in microfahrieation and analysis technology are reviewed. After an introduction to the operating principles of FIB,the use of FIB for maskless micromachining is mainly described, such as etching, deposition, implantation,analysis,imagination and maskless lithography, as well as combination of FIB with other analysis equipments. Thereof, some examples of recent realizations are also given.

关 键 词：聚焦离子束 刻蚀 沉积 离子注入 微区分析与加工 无掩膜曝光 

分 类 号：TP333.403[自动化与计算机技术—计算机系统结构]