在有机玻璃基底上制备ITO透明导电膜  

ITO THIN FILM DEPOSITION ON POLYALKYLMETHACRYLATE SUBSTRATE

作　　者：程珊华[1] 李育峰[1] 宁兆元[1] 

机构地区：[1]苏州大学薄膜材料实验室

出　　处：《微细加工技术》1996年第2期54-57,共4页Microfabrication Technology

摘　　要：使用直流辉光和微波电子回旋共振两种等离子体辅助反应蒸发法在有机玻璃基底上制备了透明导电ＩＴＯ膜。在实验中详细地研究了氧分压对膜的透光率和方阻的影响。由于等离子体对膜料的活化和对基片表面的轰击效应．降低了沉积温度。ITO films have been deposited on the polyalkylmethacrylate substrates by DC arc plasma and ECR plasma aided reactive vaporization. In the experimentsthe effects of oxygen pressure on the transmittance and sheet resistance of the films have also been investigated. The deposition temperature can be decreased due to activation of the film components by plasma and impact of plasma on the substrate.

关 键 词：氧化铟锡导电膜 有机玻璃基底 低温淀积 

分 类 号：O484.1[理学—固体物理]