离子束辅助反应电子束蒸发TiO_2薄膜的结构和光学性能  

Structure and Optical Properties of TiO_2 Thin Film Deposited by Ion Beam Assistant Reactive Electron Beam Evaporation

作　　者：杨陈[1] 樊慧庆[1] 李创[1] 陈晋 

机构地区：[1]西北工业大学材料学院光电信息功能材料研究所,陕西西安710072

出　　处：《材料科学与工程学报》2007年第1期14-17,共4页Journal of Materials Science and Engineering

摘　　要：TiO2具有较高的折射率和介电常数,在光学和电子学方面有着广泛的应用。本论文采用离子束辅助反应电子束真空蒸镀法,以Ti为膜料,纯度为99.99%的O2为反应气体,通过电子束蒸发,在玻璃衬底上反应生成TiO2薄膜。使用XRD、SEM分别对50℃1、50℃、300℃三个不同衬底温度下沉积的薄膜及其经过450℃真空退火1h后的结构进行了分析,对薄膜的折射率、透射率进行了测量。结果表明,与传统的电子束蒸发相比,离子束辅助电子束蒸发可以增加成膜原子的能量,使沉积的薄膜结构致密,所制备的薄膜具有较高的折射率,并且薄膜在可见光范围内具有良好的透过性能。TiO2 has high refractive index and dielectric constant and plays an important role in the fields of optics and electronics. In this article, TiO2 films are prepared on glass subatrate by ion beam assistant thermal oxidative electron beam evaporation. Ti（AT2） is used as the evaporated martial and high purity O2 （99.99%） is used as the thermal oxidative gas. TiO2 films have been deposited at 50℃, 150℃ and 300℃ respectively. Then as-deposited TiO2 films are annealed in vacuum at 450℃ for 1h. The structures and optical properties of TiO2 films are studied with XRD, SEM, Ellipsometry and Spectrophotometer. As a result, by the ion beam assistant thermal oxidative electron beam evaporation of Ti, a high pure TiO2 film can be prepared with compact structure and good optical property.

关 键 词：TIO2薄膜 电子束蒸发 薄膜结构 光学性质 

分 类 号：O484[理学—固体物理]