检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:赵学增[1] 李洪波[1] 褚巍[1] 肖增文[1] 李宁[1]
机构地区:[1]哈尔滨工业大学机电工程学院,哈尔滨150001
出 处:《机械工程学报》2007年第1期214-218,共5页Journal of Mechanical Engineering
基 金:2003年教育部留学回国人员科研启动基金;哈尔滨工业大学校基金(HIT.2002.28)资助项目
摘 要:对目前线边缘粗糙度(Line edge roughness,LER)的研究进行了分类,区分线宽变化率、线的边缘粗糙度和侧墙(边缘)粗糙度的物理本质。重新给出一个LER定义,定义LER是由加工工艺和材料本身结构引起的刻线侧墙的表面形貌微观不规则程度,并分析给出定义的合理性。给出该定义和ITRS定义间的换算关系。结合刻线的加工过程主要发生在刻线的边缘表面,且该加工过程发生于深纳米尺度,给出一种基于原子尺度的LER计量模型,在该模型中分离了材料本质粗糙度。The current study status of line edge roughness (LER) is analyzed, which indicates LER itself has already been used to refer to many properties including line width uniformity, roughness of line edge and sidewall roughness. And the different meaning of LER is explained. A new definition of LER is brought forward, i.e, LER is the microcosmic roughness of the sidewall topography, which is caused by processing and the character of materials measured. At the same time, explain the definition relation with it from ITRS and also analysis this definition rationality. According to the process which is mainly on the edge surface and dimension is in nanometer field, a mathematics model to calculate LER is shown in atomic dimension. In this model, the roughness from the material intrinsical character is separated.
关 键 词:纳米计量 临界尺寸 线边缘粗糙度 材料本质粗糙度 扫描电子显微镜(SEM) 原子力显微镜(AFM)
分 类 号:TG84[金属学及工艺—公差测量技术] TH161[机械工程—机械制造及自动化]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.49