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作 者:高勇[1] 张新[1] 刘梦新[1] 安涛[1] 刘善喜 马立国[2]
机构地区:[1]西安理工大学,西安710048 [2]华东光电集成器件研究所,蚌埠233042
出 处:《Journal of Semiconductors》2007年第2期159-165,共7页半导体学报(英文版)
摘 要:Modeling analysis of thin fully depleted SOICMOS technology has been done. Using ISETCAD software,the high temperature characteristics of an SOICMOS transistor were simulated in the temperature range of from 300 to 600K, and the whole circuit of a laser range finder was simulated with Verilog software. By wafer pro- cessing,a circuit of a laser range finder with complete function and parameters working at high temperatures has been developed. The simulated results agree with the test results. The test of the circuit function and parameters at normal and high temperature shows the realization of an SOICMOS integrated circuit with low power dissipation and high speed, which can be applied in laser range finding. By manufacturing this device, further study on high temperature characteristics of shorter channel SOICMOS integrated circuits can be conducted.基于薄膜全耗尽SOICMOS工艺,进行了建模分析,在300~600K温度范围内,利用ISETCAD软件对SOICMOS器件单管高温特性进行了模拟分析,同时利用Verilog软件对激光测距电路进行了整体仿真.通过工艺流片,实现了一种电路级具有完整功能和参数要求的高温工作的激光测距SOICMOS集成电路.通过实际测试表明模拟结果与之相吻合,同时通过对整体电路结果功能和参数在常温和高温下的测试,表明该电路功耗低、速度快,可满足激光测距电路的要求.该电路的研制,对进一步开展高温短沟道SOICMOS集成电路的研究具有一定的指导意义.
关 键 词:silicon on insulator high temperature characteristics TRANSISTOR thin fully depleted
分 类 号:TN433[电子电信—微电子学与固体电子学]
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