磁控溅射TiO_2膜的真空度对薄膜亲水性影响的实验研究  

Oxygen Pressure and Hydrophilicity of TiO_2 Films Grown by Reactive Magnetron Sputtering

作　　者：巴德纯[1] 常学森[1] 闻立时[2] 刘坤[1] 

机构地区：[1]东北大学真空与流体工程研究中心,沈阳110004 [2]中国科学院金属研究所,沈阳110015

出　　处：《真空科学与技术学报》2007年第2期155-158,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：采用反应溅射技术可以制备出具有亲水作用的TiO2薄膜。这种TiO2薄膜断面呈现柱状晶体结构。薄膜表面出现不规则起伏。薄膜的晶相主体均为锐钛矿型。TiO2薄膜的光透射谱变化不大。这种TiO2薄膜经紫外光辐照后,可以降低水和TiO2薄膜表面之间的接触角。不同工艺条件下制备的TiO2薄膜接触角相差很大。在纯氧条件下,薄膜制备的真空度对薄膜的亲水性有着决定性的影响。Titanium oxide ftlms were grown by reactive magnetron sputtering trader different pressures of pure oxygen,ranging from 1,0 Pa to 4.0 Pa, at a fixed oxygen flow rate of 10 cm^3/min.The surface microstructures were characterized with X-ray diffraction（XRD） and atomic force microscopy（AFM）. The results show that the film gorwn trader the oxygen pressure of 2.5 Pa displays the best hydrophilicity, Interesting fincling is that ultraviolet light irradiation considerably reduces its water contact angle.Possible mechanism（s） was also tentatively discussed,

关 键 词：TIO2薄膜 亲水特性 反应溅射 真空度 

分 类 号：TB43[一般工业技术]