IBAD工艺中离子参数与薄膜折射率研究  

The Relation of Ion Parameter and the Optical Properties of Films by IBAD

作　　者：杭凌侠[1] 刘政[1] 

机构地区：[1]西安工业大学光电工程学院,西安710032

出　　处：《西安工业大学学报》2007年第1期15-18,23,共5页Journal of Xi’an Technological University

基　　金：陕西省教育厅项目(05JS02);国防基础科研项目

摘　　要：采用五栅网离子能量测量装置和法拉第筒测量了宽束冷阴极离子源的离子能量和离子束流密度.当Ar气流量为20 sccm,在不同的放电电压和引出电压下,测得离子能量分布范围为400～820 eV,束流密度分布范围为7.8～52.8μA/cm2.在O2气流量为20 sccm时,沉积在不同离子能量辅助下的TiO2薄膜,研究了离子能量对于薄膜光学特性的影响,得到了折射率为2.3的薄膜,接近块状材料的折射率.The ion energy and the density of beam flux of cold cathode ion source were measured by pentagrid probing and Faraday cup. When the flux of Ar was 20 sccm,the measured distribution of ion energy was in the range of 400-820 eV,and the density of beam flux around 7.8-52. 8μA/cm^2. When the mass flux of O2 was 20 sccm, TiO2 films was deposited by IBAD in the different ion energy. The optical properties of TiO2 films was studied, the result showed the refractive index of films was 2. 3, which elosed with the property of bulk material.

关 键 词：冷阴极离子源 离子能量 离子束流密度 折射率 

分 类 号：O484.4[理学—固体物理]