XeCl(308nm)脉冲准分子激光淀积类金刚石薄膜  

Pulsed Laser Deposition of Diamond Like Carbon Film with XeCl (308 nm) Laser

作　　者：李铁军[1] 刘晶儒[1] 王丽戈[1] 

机构地区：[1]西北核技术研究所高功率准分子激光实验室

出　　处：《光学学报》1997年第3期331-337,共7页Acta Optica Sinica

摘　　要：利用ＸｅＣｌ（３０８ｎｍ）脉冲准分子激光淀积技术在功率密度５×１０８Ｗ／ｃｍ２、室温、真空度１０－３Ｐａ的条件下，制备出不含氢成分的类金刚石薄膜，研究了类金刚石薄膜的特性及其随制备工艺条件的变化规律。研究了激光诱导的碳等离子体发射光谱，探讨了类金刚石薄膜的形成机理。Hydrogen free Diamond Like Carbon (DLC) films have been deposited by XeCl(308 nm) pulsed laser ablation of graphite targets with a base pressure of only 1×10 -3 Pa. The deposition process is performed with a laser power density of 5×10 8 W/cm 2 at room temperature. Properties of the films and the effects of a variety of process parameters on the film properties have been investigated. The emission spectra of laser induced plasma and the key factors in the process of DLC film deposition are discussed.

关 键 词：类金刚石 薄膜 激光 脉冲激光淀积 

分 类 号：O484.41[理学—固体物理]