HfO2高激光损伤阈值薄膜的制备及特性研究  

Characterization and Preparation of Hafnia Films with High Laser-induced Damage Threshold

作　　者：沈军[1] 罗爱云[1] 王生钊[1] 欧阳玲[1] 谢志勇[1] 朱玉梅[1] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092

出　　处：《武汉理工大学学报》2007年第E01期176-179,共4页Journal of Wuhan University of Technology

基　　金：国家自然科学基金重点资助项目（21033040）,国家高技术863计划（2002AA84052）,上海科委纳米专项（0552nm08）,教育部跨世纪优秀人才计划资助项目,上海市重点学科建设资助项目（02SL001）和上海市科技攻关计划（055211010）.

摘　　要：采用水热合成技术，制备了HfO2胶体，用旋涂法镀制了单层HfO2介质膜。采用XRD，椭偏仪，红外光谱（FTIR）等方法对薄膜进行了测试和表征，用输出波长为1064nm，脉宽为10ns的电光调Q激光系统产生的强激光测试其激光损伤阈值。研究了热处理温度对薄膜厚度、折射率、红外光谱、晶态以及激光损伤阈值的影响，并对薄膜的激光损伤形貌进行了分析。研究结果表明：HfO2薄膜的折射率可达到1．655；采用150℃左右的温度对薄膜进行热处理可以提高薄膜的激光损伤闽值，此时薄膜的激光损伤阈值高达42．32J／cm^2（1064nm，10ns），大大高于物理法制备的HfO2薄膜的激光损伤阂值（8．6J／cm^2，1064nm。12ns）。HfO2 sol was obtained by hydrothermal synthesis from HfOCl2. 8H2O. Thin HfO2 films were prepared with spin coating method. The HfO2 films were characterized by ellipsometer, FTIR and X-ray diffraction respectively. And 1-on-1 laserinduced damage threshold tests on HfO2 films were carried out with a Q-switched Nd-YAG high power laser at 1 064 nm with a pulse width of 10 ns. The influences of the heating treatment on the properties of the HfO2 were studied and the morphologies of the damaged films were analyzed. The experimental results showed that the HfO2 thin films could obtain a refractive index of 1. 655, and the HfO2 films performed excellent anti-laser damage properties. The LIDT of the thin films heated at 150 ℃ was 42.32 J/cm^2（ 1 064 nm, 10 ns）, which is much higher than that of the HfO2 films derived from physical methods（8.6 J/cm^2, 1 064 nm, 12 ns）.

关 键 词：HFO2薄膜 旋涂工艺 热处理 高折射率 激光损伤阈值 

分 类 号：O484[理学—固体物理]