Mo/Si软X射线多层膜的界面粗糙度研究  

Interface roughness of Mo/Si soft X-ray multilayers

作　　者：秦俊岭[1] 邵建达[1] 易葵[1] 周洪军[2] 霍同林[2] 范正修[1] 

机构地区：[1]中国科学院上海光学精密机械研究所 [2]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《强激光与粒子束》2007年第5期763-766,共4页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题;教育部"同步辐射博士生创新中心"研究生创新基金资助课题

摘　　要：用磁控溅射法分别制备了以Mo膜层和Si膜层为顶层的Mo/Si多层膜系列,利用小角X射线衍射确定了各多层膜的周期厚度。以不同周期数的Mo/Si多层膜的新鲜表面近似等同于同一多层膜的内界面,通过原子力显微镜研究了多层膜界面粗糙度随膜层数的变化规律。并在国家同步辐射实验室测量了各多层膜的软X射线反射率。研究表明:随着膜层数的增加,Mo膜层和Si膜层的界面粗糙度先减小后增加然后再减小,多层膜的峰值反射率先增加后减小。A series of Mo/Si multilayers were prepared by magnetron sputtering, with top layers being Mo layer and Si layer respectively. Periodic length of Mo/Si multilayers were determined by small angle X-ray diffraction. As fresh surfaces of Mo/Si multilayers with different period number were approximatively equal to the interface of the same multilayer, interface roughness change law of multilayers as layer number increases was studied by atomic force microscope. Soft X-ray reflectivity of Mo/Si multilayers were measured in National Synchrotron Radiation Laboratory. As the number of layers increases, interface roughness and peak reflectivity of multilayers first increase and then reduce.

关 键 词：MO/SI多层膜 软X射线 界面粗糙度 反射率 

分 类 号：O43[机械工程—光学工程]