辅助外加热直流等离子体中放电参数的影响  

The Effect on the Parameter of DC Plasma Vapour Deposition

作　　者：谢雁[1] 赵程[1] 李世直[1] 

机构地区：[1]青岛化工学院等离子体表面技术研究所

出　　处：《真空电子技术》1997年第3期11-13,共3页Vacuum Electronics

摘　　要：由于采用辅助外加热式离子轰击，减少了放电对放电工件形状、位置的影响，与单纯靠离子轰击放电加热时的放电电流及电压加以比较得出其优点所在。Plasma-assisted chemical vapour deposition is a modern technique for depositing various hard coatings on different materials and geometriecally complicated substrates. A DC electrical glow discharge was used in this process to increase the activation of species witch form the TiN layer. By use of an auxiliary heating source,it has a advantage for different geometries of workpieces and for different workload size.

关 键 词：等离子体 沉积 辅助加热 

分 类 号：TN136[电子电信—物理电子学]