FDLC薄膜的化学结构对光学性能的影响  

Influence of chemistry structure of FDLC film on optical property

作　　者：刘雄飞[1] 张德恒[1] 齐海兵[1] 

机构地区：[1]中南大学物理科学与技术学院,长沙410083

出　　处：《应用光学》2007年第1期51-54,共4页Journal of Applied Optics

摘　　要：研究氟化类金刚石(FDLC)薄膜化学结构对光学性能的影响,用等离子体增强化学气相沉积(PECVD)法在玻璃基底上沉积氟化类金刚石(FDLC)薄膜,用俄歇能谱、傅里叶红外光谱(FT IR)、紫外-可见光分光光度计(UV-V IS)对薄膜进行分析。分析结果表明:沉积薄膜是典型的类金刚石结构,薄膜中氟主要以C-F2键存在;随着沉积温度的提高,C-F2含量先增后减;随着F含量的增加,FDLC薄膜的sp3含量减少,sp2含量增加;光学带隙与sp2键含量密切相关,sp2含量越大,薄膜的光学带隙越小。In order to study the influence of chemistry structure of FDLC film on optical property, the fluorinated diamond-like carbon （FDLC） films were deposited on the glass substrate with the method of PECVD, and analyzed by AES, FTIR and UV-VIS. The result shows that the deposited films are typical diamond-like structure and the fluorine in the films exists in the form of C-F2key ; the content of C-Fa, increases in the first period and then reduces as the temperature continuously rises in the deposition process ; the sp3 content of FDLC films decreases and the sp2content increases when the fluorine content increases; the optical band gap has a close relationship with the content of sp2key, and the more the sp2content is, the smaller the optical band gap will be.

关 键 词：氟化类金刚石薄膜 等离子体增强化学气相沉积(PECVD) 光学带隙 沉积温度 

分 类 号：TN304-055[电子电信—物理电子学]