气相沉积技术制备TiN类硬质膜  

Fabricating ceramic hard thin films by vapor deposition techniques

作　　者：田永生[1] 陈传忠[1] 王德云[1] 雷廷权[2] 

机构地区：[1]山东大学材料科学与工程学院,山东济南250061 [2]哈尔滨工业大学材料科学与工程学院,黑龙江哈尔滨150001

出　　处：《材料科学与工艺》2007年第3期439-444,共6页Materials Science and Technology

基　　金：山东省优秀中青年科学家科研奖励基金(02BS056).

摘　　要：硬质膜由于具有良好的耐磨、耐蚀和耐热等特点,所以在航天、化工和机械等领域获得了日益广泛的应用,而硬质膜的组成和制备工艺也随之得到不断发展.本文综述了TiN类硬质膜的应用和制备硬质膜常用的气相沉积方法、工艺参数及其优缺点.阐明了制备工艺正向着以三束(电子束、离子束和激光束)为基础多种工艺复合的方向发展.而硬质膜正向着多元膜、梯度膜和纳米复合膜方向发展.Owing to excellent physical and mechanical properties, hard thin films are finding increasing uses in aeronautical, chemical and mechanical industry. Therefore, the filming technologies and the composition of thin films are improved continuously. In this paper, current techniques for fabricating hard thin films are reviewed. The advantages and disadvantages of the filming technologies and the effect of processing parameters on the properties of hard thin films are discussed. The current developing trends of filming technologies toward using electronic beam, ion beam and laser beam combining other filming technologies and the trends of high quality films toward multicomponent film, gradient composite film and nanocomposite film are illustrated.

关 键 词：硬质膜 陶瓷 制备工艺 进展 气相沉积 

分 类 号：O484.1[理学—固体物理]