磁控溅射离子镀基体偏压对类石墨碳膜组织形貌及性能的影响  

Effect of bias voltage on morphology and performance of magnetron sputter ion plating graphite-like carbon coatings

作　　者：梁戈[1] 郑彬娜[1] 蒋百灵[1] 李玉庆[1] 

机构地区：[1]西安理工大学材料学院,陕西西安710048

出　　处：《兵器材料科学与工程》2007年第4期13-16,共4页Ordnance Material Science and Engineering

基　　金：国家"863"科技攻关项目(2005AA33H010)

摘　　要：采用非平衡磁控溅射离子镀技术在单晶硅衬底上沉积类石墨碳膜(GLC),研究基体负偏压对GLC膜的组织形貌及性能的影响。结果表明:基体偏压影响镀层表面形貌,-30V下的镀层表面为较小颗粒状组织;-65V下的镀层表面均匀致密,无明显颗粒组织;-90V下的镀层颗粒边界趋于明显;-120V下的出现大小不均匀的颗粒。沉积速率在-65V前保持平稳,-90V时下降为0.25!m·h-1。随偏压的增加,Ar元素含量先增加后降低。Graphite-like carbon （GLC） coatings were synthesized by unbalanced magnetron sputtering ion plating on single crystal silicon substrate. The effect of bias on the morphology and performance of GLC coatings was investigated. The result shows that the surface morphology of coating was influenced by bias voltage. The morphology of -30 V was smaller grain, the surface of -65 Vcoating was uniform and dense when observed by SEM, the boundary of particles were obviously observed at -90 V, non-uniform particles appear at the surface of -120 Vcoating. Before bias increasing to -65V, the deposition rates remain unchanged. However when bias increased to-90 V, the deposition rates rapidly descended to 0.25 μm. h^-1. The XPS experimentation results show with bias gradually increasing from -30 V to -65 V, the argon content of coatings increased first and then slowly fell down.

关 键 词：非平衡磁控溅射 偏压 形貌 沉积速率 

分 类 号：TG174.44[金属学及工艺—金属表面处理]