TiN/AlN纳米多层膜的调制周期及力学性能研究  

Study on modulation period and mechanical properties of TiN/AlN nano-multilayers film

作　　者：陈德军[1] 代明江[2] 林松盛[2] 李洪武[2] 候惠君[2] 

机构地区：[1]广东工业大学,广东广州510643 [2]广州有色金属研究院,广东广州510651

出　　处：《真空》2007年第4期52-54,共3页Vacuum

摘　　要：采用一种新型的离子束辅助非平衡反应磁控溅射设备制备了TiN/AlN纳米多层复合膜。采用XRD衍射、TEM、显微硬度计和干涉显微镜对TiN/AlN纳米多层膜的微结构和力学性能进行了表征。结果表明:TiN/AlN多层膜有良好的周期;调制结构影响薄膜的择优取向,薄膜整体表现出硬度增强的效果,硬度随调制周期的变化而变化并在调制周期为7.5nm时达到最大值。TiN/AlN nano-multilayer films were deposited by an ion-beam aided unbalanced reactive magnetron sputtering system. The microstructure and mechanical properties of the films were characterized by X-ray diffraction,transmission electron microscopy, microhardness tester and optical interferometer. The results showed that the TiN/AlN nano-multilayer film has good periodic modulation to affect significantly its preferred growth orientation. As a whele, the hardness of the films increases and varies with the modulation period, and it comes up to the maximum when the period is 7.5nm.

关 键 词：纳米多层膜 调制周期 非平衡反应磁控溅射 力学性能 

分 类 号：TB43[一般工业技术]