非晶金刚石薄膜的制备及其性能研究  被引量:5

PREPARATION OF AMORPHOUS DIAMOND FILMS AND STUDY ON THEIR PROPERTIES

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作  者:赵建平[1] 王曦[1] 陈智颖[1] 杨石奇[1] 柳襄怀[1] 施天生[1] 

机构地区:[1]中国科学院上海冶金研究所离子束开放研究实验室

出  处:《功能材料与器件学报》1997年第1期67-71,共5页Journal of Functional Materials and Devices

基  金:国家自然科学基金

摘  要:本文利用一种新的等离子体沉积技术—真空磁过滤弧沉积(FAD)制备得到一种无氢的非晶碳膜。EELS分析表明,这种非晶碳膜几乎不含有sp2和sp杂化键,呈现出高度的金刚石特征,以致可以被称为非晶金刚石(aD)膜。应用紫外透射光谱(UV)、红外反射光谱以及椭偏测量等方法对aD膜的光学性能进行了测量。利用显微力学探针、X射线双晶衍射、卢瑟福背散射(RBS)技术和EELS分析等多种测量手段对aD的超显微硬度、应力以及密度等力学和结构特性进行了定量分析。另外,对这种aD膜的场电子发射性能也进行了研究。Nonhydrogenated amorphous carbon films have been prepared by a new plasma technique, filtered arc deposition (FAD) It was found that the carbon were highly sp 3 bonded so that the films were referred to as amorphous diamond (a D) UV, IR and elliposometry spectra were applied to investigate the optical properties of the formed films The mechanical properties and structure characteristics of FAD a D films were studied in detail In addition, the field emission behavior of the films were also investigated in this work

关 键 词:FAD 非晶金刚石 薄膜 弧源沉积 

分 类 号:TB43[一般工业技术] O484.4[理学—固体物理]

 

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