K9和石英玻璃基片上Au膜真空紫外反射特性研究  

Reflectivity of Au Film on K9 and Quartz Substrate in Vacuum Ultraviolet

作　　者：干蜀毅[1] 徐向东[1] 洪义麟[1] 刘颍[1] 付绍军[1] 

机构地区：[1]中国科技大学国家同步辐射实验室

出　　处：《光学学报》2007年第8期1529-1535,共7页Acta Optica Sinica

摘　　要：采用离子束溅射法,分别在经过不同前期清洗方法处理过的K9及石英玻璃光学基片上,选择不同的镀膜参量,镀制了多种厚度的Au膜。对镀制的Au膜在真空紫外波段较宽波长范围内的反射率进行了连续测量。测试结果表明:辅助离子源的使用方式、Au膜厚度对反射镜的反射率有重大影响。基片材料、镀前基片表面清洗工艺等对反射率也有一定影响。采用镀前离子轰击,可显著提高Au膜反射率及膜与基底的粘合力;获得最高反射率时的最佳膜厚与基片材料、镀膜工艺密切相关。对经过离子清洗的石英基片,膜厚在30 nm左右反射率最高;比较而言,石英基片可获得更高的反射率;辅助离子源的使用还显著影响获得最高反射率时对应的最佳膜厚值,且对K9基片的影响更显著。Au films of various thicknesses are fabricated by ion-beam sputtering with different coating parameters on quartz and K9 substrate which are processed with different cleaning procedures. Their reflectivity is measured continuously in a broad vacuum ultraviolet range. It is indicated that the auxiliary ion-beam source and the film thickness impact significantly on the reflectivity. Substrate material and cleaning procedure also affect reflectivity of Au film to some extent. Ion-beam bombardment of substrate before deposition can significantly enhance the reflectivity and adhesion of films. The optimal film thickness for the highest reflectivity connects closely with substrate material and coating techniques. For quartz substrate processed by ion bombardment pre-deposition, the optimal film thickness is about 30 nm, and the reflectivity of quartz is higher than Kg. The use of auxiliary ion beam source influences the optimal film thickness for the highest reflectivity, and the influence is larger for K9 substrate.

关 键 词：薄膜光学 真空紫外反射镜 离子束溅射 真空紫外反射膜 Au膜 K9玻璃基片 石英玻璃基片 

分 类 号：TB133[机械工程—光学工程]