中频磁控溅射沉积梯度过渡Cr/CrN/CrNC/CrC膜的附着性能  

Adhesion of Cr/CrN/CrNC/CrC graded interlayer deposited by MF-magnetron sputtering

作　　者：牛仕超[1] 余志明[1] 代明江[2] 林松盛[2] 侯惠君[2] 李洪武[2] 

机构地区：[1]中南大学材料科学与工程学院,长沙410083 [2]广州有色金属研究院材料表面工程研究所,广州510651

出　　处：《中国有色金属学报》2007年第8期1307-1312,共6页The Chinese Journal of Nonferrous Metals

基　　金：国家科技部资助项目(国科发财字[2005]300号)

摘　　要：采用中频磁控溅射结合无灯丝离子源技术沉积梯度Cr/CrN/CrNC/CrC膜层,设计两组正交实验对膜层中界面Cr层及梯度层沉积的工艺参数对附着性能的影响进行研究。利用扫描电镜(SEM)、电子能谱(EDS)对其表面形貌及梯度成分进行表征;用划痕仪、显微硬度计及洛氏硬度计测评其附着性能,并对比两者测评的有效性。所得最优工艺参数为:梯度层沉积偏压100 V,中频功率6.5 kW,真空度0.6 Pa;Cr层的沉积时间、离子源电流及中频功率分别为2 min、4 A和6.5 kW。高中频功率及离子辅助沉积Cr层能有效提高膜层附着力。The Cr/CrN/CrNC/CrC graded interlayer was deposited by MF-magnetron sputtering combined with ion source technique. Two orthogonal experiments were designed to study the relationship between adhesion and processing parameters both for Cr-interface and interlayer. Surface morphology and composition of graded interlayer were characterized by SEM and EDS. The results show that, the optimum deposition parameters for interlayer are -100 V bias voltages, 6.5 kW MF power under pressure of 0.5 Pa; the optimum deposition parameters for Cr layer are deposition time of 2 rain, ion resource current of 6 A and MF power of 6.5 kW. The deposition of Cr layer with high MF power and assistance of ion beam can improve the adhesion.

关 键 词：CRC 中频磁控溅射 离子源 附着力 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TB43[金属学及工艺—金属学]