LCVD法沉积Si_3N_4薄膜微透镜的研究  

A Study of Si_3N_4 Film Microlenses Deposited by Laser Chemical Vapor Deposition

作　　者：宋国瑞[1] 兰祝刚[1] 姚惠贞[1] 

机构地区：[1]华南理工大学电子与通信工程系,广州510641

出　　处：《真空科学与技术》1997年第2期84-87,共4页Vacuum Science and Technology

基　　金：国家自然科学基金;广东省自然科学基金

摘　　要：介绍了一种利用激光化学气相沉积（LCVD）技术，在平面石英玻璃衬底上沉积平凸形Si3N4球面介质膜用作微透镜，包括LCVD的实验装置及其沉积工艺、实验结果表明，只要适当控制源气体的化学配比与浓度，调节激光功率与衬底上的聚焦激光光斑尺寸，选择适当的沉积时间，就可以获得不同直径、透明、表面光滑的Si3N4球面介质膜，用作微透镜。In this paper,a technique of depositing plano-convex Si3N4 film on flat quartz substrate used as microlens was introduced. First,an experiment installation of LCVD was described and the technology of deposition was discussed. All of test results indicated that as long as the chemical mlxture radio and concentration of source gases were controled,the laser power and the spot size on the laser-irradiated substrate were adjusted properly,the deposition time was selected appropriatelly, so the transparent smooth spherical Si3N4 films with different diameter used as microlenses could be obtained.

关 键 词：LCVD 微透镜 氮化硅 薄膜技术 

分 类 号：TB43[一般工业技术]