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作 者:林松盛[1] 代明江[1] 侯惠君[1] 李洪武[1] 朱霞高[1] 林凯生[1]
机构地区:[1]广州有色金属研究院材料表面工程研究所,广州510651
出 处:《真空科学与技术学报》2007年第5期418-421,共4页Chinese Journal of Vacuum Science and Technology
摘 要:采用无灯丝离子源结合非平衡磁控溅射的方法,在模具钢及单晶硅基体上制备了梯度过渡的掺钛类金刚石(Ti-DLC)膜层,利用俄歇电子谱(AES)、透射电镜(TEM)、X射线光电子能谱(XPS)及X射线衍射(XRD)等手段对膜层的过渡层、界面及微观结构进行研究。结果表明:制备的膜层成分深度分布与所设计的基体/Ti/TiN/TiCN/TiC/Ti-DLC相吻合,在梯度过渡中不同膜层之间界面体现为渐变过程,结合非常良好;少量的Ti主要以纳米晶TiC的形式掺入到非晶DLC膜当中;所制备的膜层具有厚2.9μm、硬度高达25.77 GPa、膜/基结合力44 N-74 N。Ti-doped diamond-like carben(DLC) films were grown by non-filament ion beam source(IBS) and unbalanced magnetron sputtering on steel and silicon substrates. The microstructures and mechanical properties of the films were characterized with Anger electron spectroscopy(AES), transmission electron microscopy(TEM), X-ray photoelectron spectroscopy(XPS), X-ray diffraction(XRD), scratch tester and nano-indentation. The results show that the depth profile of the films agrees well with the design: Ti-DLC/TiC/TiCN/Ti/substrate and that a gradient transition was observed with strong interfacial adhesion at the interfaces of the different layers. Small amount of Ti, in the form of TiC nano-particles, was found to be doped into amorphous DLC layer. The surface hardness and interfacial adhesion of the 2.9 tan thick film were evaluated to be 25.77 GPa and 44 N- 74 N, respectively.
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