研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟  

A Simulation Study of the Influence of Interdiffusion Barrier on Soft X-ray Reflectivity of Mo/Si Multilayers

作　　者：秦俊岭[1] 邵建达[1] 易葵[1] 范正修[1] 

机构地区：[1]中国科学院上海光学精密机械研究所

出　　处：《光子学报》2007年第2期300-303,共4页Acta Photonica Sinica

基　　金：国家高技术研究发展计划(2005AA847033)资助

摘　　要：在特定波长下,用四层结构模型模拟了Mo/Si多层膜的软X射线反射率.研究了扩散屏障层dMo-on-Si和dSi-on-Mo对Mo/Si多层膜软X射线反射率的影响.研究发现,扩散屏障层并不总是损害Mo/Si多层膜的光学性能,通过合理设计dMo-on-Si和dSi-on-Mo厚度,增加dMo-on-Si与dSi-on-Mo的比值,也能提高多层膜的软X射线反射率.A four-layer model was used to simulate soft X-ray reflectivity of Mo/Si multilayers at a given wavelength. By simulation, the influence of interdiffusion barrier dMo-on-Si and dSi-on-Mo on the soft X-ray reflectivity of Mo/Si multilayers has been detailedly studied. The simulation study shows that interdiffusion barrier is not always disadvantageous to optical capability of Mo/Si multilayers, through designing a right thickness of dMo-on-Si and dSi-on-Mo ,increasing the thickness ratio of dMo-on-Si and dSi-on-Mo,it can also improve soft X-ray reflectivity of multilayers.

关 键 词：软X射线 多层膜 扩散屏障层 MO/SI 反射率 模拟 

分 类 号：O484.5[理学—固体物理]