气体离化团束对表面的平坦化及清洁化效果  

The Smoothing and Cleaning Effects on Substrate Surface by Gas Cluster Ion Beams

作　　者：田民波[1] 山田公[2] 

机构地区：[1]清华大学材料科学与工程系,北京100084 [2]日本京都大学离子束工学实验室

出　　处：《真空科学与技术》1997年第4期252-258,共7页Vacuum Science and Technology

摘　　要：用原子力显微镜测量了气体离化团束照射后表面粗糙度的变化。已经证实气体团束轰击对表面沾污具有很高的清除率，同时却引起较低的损伤。气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。Changes in surface roughness after gas cluster ion bombardments have been measured by an atomic force microscope. A high removal rate of surface impurities by ion cluster bombardment has been confirmed in connection with low damage effects. The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision,lateral sputtering and high density energy deposition.

关 键 词：气体离化团束 溅射 表面平坦化 表面清洁化 

分 类 号：TN305.92[电子电信—物理电子学]