热氧化法制备透明超疏水ZnO薄膜  

Preparation of highly transparent superhydrophobic ZnO film by a simple thermal oxidation route

作　　者：刘毅[1] 谭天[1] 宋雪梅[1] 李耳[1] 王波[1] 严辉[1] 

机构地区：[1]北京工业大学材料学院薄膜材料与技术实验室,北京100022

出　　处：《功能材料》2007年第A01期303-306,共4页Journal of Functional Materials

基　　金：基金项目：国家自然科学基金资助项目（50502001;60576012）;北京市自然科学基金资助项目（2062004）;北京市优秀人才工程资助项目（20041D0501513）

摘　　要：高透明性的无机超疏水薄膜材料具有广阔的应用前景，采用磁控溅射法制备出表面具有纳米结构的金属Zn前驱体薄膜，并利用在低气压5Pa，温度350℃热氧化方法对其采取了处理，获得了接触角为151°，可见光透过率达80％以上的超疏水ZnO薄膜。SEM表明薄膜由100nm短棒状的ZnO堆积而成，通过XRD，IR的测量与分析，进一步讨论了沉积条件及热氧化处理对超疏水透明ZnO薄膜形成机理。Inorganic superhydrophobic materials with high transparency attract much attention for their prominent applications. In this paper, Zinc thin films were deposited onto glass substrates using magnetron sputtering in argon atmospheres, and then the surface of as-deposited films were followed by thermal oxidation processing in with the air pressure 5 Pa at 350℃ for lh to form thin ZnO films. The surface microstructure is investigated by SEM, XRD and IR. CA. The as prepared ZnO film had a dense structure with oxide nanorod on the surface. These films had high optical transmittance in visible light region and exhibited strong water repellency. Furthermore, the formation of the transparent ZnO with hydrophobic performance is discussed briefly.

关 键 词：超疏水 ZNO薄膜 溅射 热氧化 透明 

分 类 号：TB43[一般工业技术]