金属基体上硬质薄膜内应力的释放测量法  

Measurement of Internal Stresses in Hard Films Grown on Metal Substrate

作　　者：黄碧龙[1] 吴莹[1] 戴嘉维[1] 李戈扬[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《真空科学与技术学报》2007年第6期545-548,共4页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(No.50571062)

摘　　要：提出了一种基于Stoney公式测量金属基体上硬质薄膜内应力的应力释放法,并研究了不同基底温度对磁控溅射TiN薄膜内应力的影响。In this paper, a new way of measurement based on Stoney Equation was proposed, in which the internal stresses in the hard thin films deposited on metal substrate could be measured. And the effect of the substrate＇s temperature on internal stresses in magnetron sputtering TiN thin films was evaluated.

关 键 词：硬质薄膜 内应力 

分 类 号：O484.43[理学—固体物理]