同步辐射X射线深度光刻实验  

TECHNIQUE OF DEEP X-RAY LITHOGRAPHY WITH SYNCHROTRON RADIATION

作　　者：伊福廷[1] 习复[2] 唐鄂生[1] 郑宏卫 晋明[1] 冼鼎昌[1] 

机构地区：[1]中科院高能物理研究所同步辐射室,北京100039 [2]中科院化学研究所,北京100080

出　　处：《微细加工技术》1997年第2期31-33,共3页Microfabrication Technology

摘　　要：深度同步辐射光刻是LIGA技术的关键工艺环节。利用同步辐射X射线的高平行性、硬射线的高强度，可以光刻出非常深的胶结构，并且这一结构有着很好的尺寸精度和垂直精度，对加工出微型机械结构，具有重要作用。The deep X-ray lithography with synchrotron radiation is a very important step in LIGA process. A very deep resist structure with high size precision and high vertical property could be fabricated with synchrotron radiation,because the hard X-ray light has very good parallel property and strong power. Many micromechanism parts can be fabricated with this deep X-ray lithography.

关 键 词：LIGA技术 同步辐射 X射线 光刻 

分 类 号：TN305.7[电子电信—物理电子学]