多光点扫描数字光刻制作DOE的方法研究  

Research on the method of fabricating DOE by digital lithography system with mutipedots scanning

作　　者：方亮[1] 段茜[1] 郭小伟[1] 王景全[1] 张志友[1] 杜惊雷[1] 

机构地区：[1]四川大学物理科学与技术学院纳光子技术研究所,成都610064

出　　处：《四川大学学报（自然科学版）》2007年第6期1315-1320,共6页Journal of Sichuan University(Natural Science Edition)

基　　金：国家自然科学基金(60676024;60376021);微细加工光学技术国家重点实验室基金

摘　　要：在DMD(Digital Micromirror Device)数字光刻系统中使用微透镜阵列聚焦可在像面获得灰度点阵图形,若曝光的同时基底按预设计的方式同步扫描,则可形成所需求的曝光场分布.这一方法用于衍射微光学元件(DOE)制作,可方便快捷获得高质量的连续面形微结构.文中通过对扫描方式的分析和计算,给出了适于菲涅耳微透镜制作的基片台扫描参数和模拟结果,为用该系统进行DOE实际制作提供了依据.Gray-tone point arry can be obtained by introducing a microlens array into DMD（Digital Micromirrot Device）digital lithography system . At the time of exposure, the substrate scans synchronously by a designed mode in order to form a desirable exposure field. Using this system to fabricate DOE could obtain a high-quality consecutive microstructure conveniently and swiftly. In this paper, the scan parameters of substrate and simulation results that were suitable for fabricating Fresnel diffractive microlen were given out through the analysis and calculation of the scan mode, which provids a basis for the use of this system to fabricate DOE practically.

关 键 词：DMD 数字光刻 分辨率 扫描 DOE 

分 类 号：TN305.7[电子电信—物理电子学]