直流电弧等离子体喷射在金刚石膜制备和产业化中的应用  

Application of DC arc plasma jet in the commercialization of CVD diamond films

作　　者：吕反修[1] 唐伟忠[1] 李成明[1] 宋建华[1] 黑立富[1] 

机构地区：[1]北京科技大学材料学院,北京100083

出　　处：《金属热处理》2008年第1期43-48,共6页Heat Treatment of Metals

基　　金：国家自然科学基金项目(50572007)

摘　　要：综述了北京科技大学在直流电弧等离子体喷射CVD金刚石膜沉积系统研制和改进及大面积高质量(包括光学级)金刚石自支撑膜沉积的研究进展和产业化状况。用同样技术研发出了可用于复杂形状硬质合金工具金刚石膜涂层工具批量生产的强电流直流伸展电弧等离子体CVD金刚石膜涂层系统,讨论了利用该设备研发金刚石膜涂层硬质合金工具及其现场切削试验的结果。The development and improvement of DC arc plasma jet CVD diamond film deposition system and research progress and commercialization of large area high quality freestanding diamond films in the University of Science and Technology Beijing were reviewed. Based on the same technology, high current extended DC arc plasma CVD diamond film deposition system, applicable in mass production of diamond film coated WC-Co cutting tools with complicated shape,was developed. The preparation of diamond film coated WC-Co tools by this system and the cutting test results were discussed.

关 键 词：直流电弧等离子体喷射 金刚石自支撑膜 金刚石膜涂层硬质合金工具 产业化 

分 类 号：TG174.44[金属学及工艺—金属表面处理]