ECR结合磁控溅射——制备DLC薄膜的新方法  

Combination of ECR and Magnetron Sputtering——New Preparation Method for DLC

作　　者：聂君兰[1] 谷坤明[2] 汤皎宁[2] 

机构地区：[1]深圳大学材料科学与工程学院特种功能材料重点实验室 [2]深圳大学

出　　处：《工具技术》2008年第3期69-71,共3页Tool Engineering

基　　金：深圳市科技计划项目(项目编号:QK200601)

摘　　要：介绍了新型的结合电子回旋共振(ECR)微波等离子体气相沉积与磁控溅射镀膜特点的ECR-650型镀膜系统,并利用该系统通过溅射石墨靶和金属钛靶在不锈钢基底上制备了具有Ti/TiNx/TiNxCy中间层结构的C薄膜。由于镀膜工艺问题,得到的薄膜主要由石墨构成。研究了制备时不同的气压和氩气分压对薄膜表面形貌、硬度等的影响。A newly designed instrttment for film deposition, ECR-650 system, which combines the features of ECR and magnetron sputtering was introduced. Carbon thin films with Ti/TiNx/TiNxCy buffer layer were fabricated on stainless steel substrates by sputtering graphite target and Ti target. Because the processing parameter for film deposition was not optimized yet, the obtained films were not DLC films but mainly composed of graphite. The influence of different pressure and different partial pressure of Ar2 and H2 on the properties of the films such as surface topography, hardness was studied.

关 键 词：含金属C薄膜 ECR溅射镀膜 磁控溅射 石墨靶 

分 类 号：O484[理学—固体物理] TN305.92[理学—物理]