膜厚对直流磁控溅射Nb薄膜微结构的影响  

Effects of thickness on microstructure and properties of Niobium films deposited by DC magnetron sputtering

作　　者：林华平[1] 吴卫东[2] 何智兵[2] 许华[2] 李俊[2] 王锋[1] 李盛印[1] 张宝玲[1] 宋萍[1] 江玲[1] 谌家军[1] 唐永建[2] 

机构地区：[1]西华师范大学物理与电子信息学院,四川南充637002 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2008年第3期413-418,共6页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目

摘　　要：采用直流磁控溅射方法制备膜厚为50,100,200,400,600 nm的Nb薄膜,对薄膜的沉积速率、表面形貌、晶体结构进行了研究,并对其应力和择优取向进行了详细的分析。原子力显微镜图像显示Nb膜表面光滑、致密,均方根粗糙度达到0.1 nm量级。X射线小角衍射给出了薄膜的晶格结构、晶粒尺寸和应力情况。分析表明薄膜为多晶体心立方结构(bcc),在(110)晶面方向存在明显的择优取向,且随着薄膜厚度增大而增强。Nb膜应力先随薄膜厚度增大而增大,在200 nm时达到最大值(为1.0151 GPa),后随薄膜厚度的增大有所减小。In this paper, Nb films with different thicknesses were fabricated by DC magnetron sputtering. The deposition rate, surface roughness, crystal structure of Nb films at different sputtering thicknesses were studied, and the RMS roughness of the Nb film was in 1×10^-1 nm level. The stress and preferred orientation of Nb films were studied. The AFM images showed that the films were compact and smooth. The X-ray diffraction results indicated that Nb films were body-centered cubic structure with a preferred orientation of （110）. The stress in the Nb films increased with the increase of the thickness of Nb film and reached a maximum of 1.015 1 GPa when the thickness was 200 nm, after that the stress decreased with the increase of the thickness of the Nb film.

关 键 词：ICF靶 直流磁控溅射 Nb膜 择优取向 体心立方 

分 类 号：O484.5[理学—固体物理]