精缩机制版阵列插图研究  

Investigation of Pattern Array Insertion Based on Photorepeater

作　　者：任芳[1] 崔伟[1] 何敏[1] 刘嵘侃[1] 

机构地区：[1]中国电子科技集团公司第二十四研究所,重庆400060

出　　处：《微电子学》2008年第2期298-301,共4页Microelectronics

摘　　要：介绍了利用3696精缩机进行制版阵列插图的研究工作,总结了插图工艺制作的基本方法、常见问题及解决办法。通过具体应用实例,对多种形式的阵列插图制作进行了有益的探讨,对光掩模版的制造具有一定的指导意义。An investigation was made on insertion of pattern arrays onto photomasks using photorepeater. The process technology for pattern array insertion was described. Problems and solutions were summarized. Based on applications in actual process, useful discussions are made about Various forms of pattern insertion. It may provide a guidance for photomask making.

关 键 词：半导体工艺 制版 精缩机 阵列插图 

分 类 号：TN307[电子电信—物理电子学]