RF磁控溅射微波介质陶瓷薄膜的影响因素及其应用  

Influence Factors and Application of Microwave Dielectric Ceramic Thin Films by RF Magnetron Sputtering

作　　者：崔传文[1] 石锋[1] 李玉国[1] 张月甫[1] 张敬尧[1] 

机构地区：[1]山东师范大学物理与电子学院

出　　处：《科学技术与工程》2008年第7期1741-1747,共7页Science Technology and Engineering

摘　　要：RF磁控溅射是目前应用最广泛的一种溅射沉积方法。由于陶瓷溅射的现象相当复杂,目前尚无完整的溅射理论可以用来分析溅射现象,所以通常通过实验来确定溅射过程中的影响因素。综述了RF磁控溅射陶瓷薄膜过程中的影响因素,阐述了微波介质陶瓷薄膜的应用前景,并指出了今后的发展方向。RF magnetron sputtering is a method of sputtering deposition which is widely used presently. Due to the fairly complicated phenomenon of ceramic sputtering, there isn＇t a complete sputtering theory to analyze it. So the factors in the course of the sputtering are usually determined by the tests. How the factors influence dielectric properties of thin films in the course of magnetron sputtering microwave dielectric ceramic thin films is generally in- dicated, and illustrated the application prospective of microwave dielectric ceramic thin films and the direction of the future development.

关 键 词：RF磁控溅射 微波介质陶瓷薄膜 影响因素 

分 类 号：O484.8[理学—固体物理]