TiN中间层对CN_x薄膜摩擦学性能的影响  

Effect of TiN Interface Layer on Tribological Properties of CN_x Films

作　　者：唐利强[1] 刘军[1] 陈志刚[2] 吴燕杰[1] 

机构地区：[1]江苏大学,江苏镇江212013 [2]江苏工业学院,江苏常州213100

出　　处：《稀有金属材料与工程》2008年第A01期477-480,共4页Rare Metal Materials and Engineering

摘　　要：采用射频反应磁控溅射法在硬质合金衬底上沉积了CN_x薄膜和CN_x/TiN复合薄膜。薄膜的结构和元素成分用傅里叶变换红外光谱(FTIR)和X射线光电子能谱(XPS)测试。红外吸收光谱说明薄膜中碳、氮原子结合成的化学键有C-N,C=N和C≡N,另外还存在少量的N-H和C-H键;X射线光电子能谱分析证明沉积中间层TiN的样品结合能位移增大,其中氮碳原子成键多,从而提高了样品的耐磨性能。The CNx films and CNxTiN multi-layers were deposited onto cemented carbide substrates by RF magnetron sputtering. The structure and elemental composition of the films were analyzed by Fourier transform infrared （FTIR） spectroscopy and X-ray photoelectron spectroscopy （XPS）. FTIR revealed the existence of the C-N, C=N, C≡N, C-H and N-H bonds in the films. XPS showed an increased binding energy shift in the TiN interface layer. The TiN interface layer improved the wear resistance of the CNx films.

关 键 词：CNX薄膜 硬质合金 X光电子能谱 摩擦性能 

分 类 号：O484.2[理学—固体物理]