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作 者:唐沪军[1] 沈杰[1] 陈华仙[1] 杨锡良[1] 顾元壮 章壮健[1]
出 处:《真空科学与技术》1997年第6期417-427,共11页Vacuum Science and Technology
摘 要:介绍介质薄膜透射光谱的测量以及基于分析薄膜透射光谱的计算薄膜光学参数的方法。对制备在玻璃基板上的二氧化钛、二氧化硅和氧化锌薄膜进行了可见光谱区的透射比测量,并用包络线方法和最优化方法对这些透明薄膜的光学参数进行了计算和分析。着重讨论了最优化方法在分析薄膜光学参数中的应用及其误差分析。此外,还对包络线方法和最优化方法进行了比较。A method to measure the transmission spectrum of the dielectric films on transparent substrate is introduced- Based on the optimization principle,a new method of calculating the thickness and optical parameters of the dielectric film from its transmission spectrum is proposed. The particular merit of this method,apart from its easiness and accuracy,is that this method makes it possible to calcu1ate films which are too thin to be calculated by the traditional envelope method. Another advantage of this method is that it can calculate the multilayer film. As an example,this optimization method is used to calculate the thickness and optical parameters of TiO2 and SiO, film and is compared with the envelope method. Some results of the ca1culation are discussed in details.
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