19.5nm极紫外反射镜的研制  

The design and fabrication of multilayer mirrors in EUV region

作　　者：赵伟[1] 袁宏韬[1] 缪同群[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所

出　　处：《光学技术》2008年第3期341-343,共3页Optical Technique

摘　　要：介绍了一种用于太阳观测19.5nm极紫外多层膜的研究工作。利用软件对规整的Mo/Si膜系结构进行了优化,拓宽了反射带宽,提高了积分反射率。采用双离子束溅射技术,时间控厚,成功制备了该反射镜。通过同步辐射反射率计测试表明,峰值反射率27.5%,均匀性在1%以内,已初步达到预设要求。Researching in EUV multilayer used for the solar EUV imaging telescope are presented. The integrated reflectivity performance and the width of the band of the quarter-wavelength multilayer can be enhanced further by needle optimization procedures with which the layer thickness is deviated from the periodic stack with the software TFCALC. The Mo/Si coatings are deposited by using the dual ion beam sputtering technique. The reflectivity performances of the coatings are tested by using the synchrotron radiation reflectometer. The results demonstrate that the peak reflectivity is up to 27.5 % and the requirements of the reflectors are preliminary met.

关 键 词：薄膜光学 极紫外 多层膜 非周期 离子束溅射 同步辐射 

分 类 号：O484[理学—固体物理]