用于大尺寸衍射光栅的光刻胶残余物的灰化系统研制  

Development of plasma photoresist descum system for large-aperture diffraction gratings

作　　者：洪义麟[1] 刘良保[1] 周小为[1] 徐向东[1] 付绍军[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《真空》2008年第3期25-27,共3页Vacuum

基　　金：国家高技术863技术资助

摘　　要：在制作大尺寸厚基底衍射光学元件时,经常需要清除残余底胶,为此我们研制了大尺寸衍射光栅灰化装置.该装置可以在450 mm×450 mm(Ф650 mm)范围内产生均匀性良好的等离子体,通过气体辉光放电来达到去残胶的目的,辉光放电速率可通过调节工作气体的浓度来控制.已用该装置灰化处理了200 mm×400 mm×50mm的脉宽压缩光栅。The descum of photoresist is often required during making optical elements of large-aperture and thick substrate. A descum system was thus developed for large-aperture diffraction gratings which can generate a well-uniformized plasma within the 450mm×450mm area or Ф650mm circle to achieve the descum of photoresist by way of gaseous glow discharge. The rate of descum can be controlled through regulating the concentration of working gas. The descum system has been used through cineration for a pulse compression diffraction grating whose size is 200mm×400mm×50mm.

关 键 词：大尺寸 衍射光栅 辉光放电 灰化 

分 类 号：O461[理学—电子物理学] TB79[理学—物理]