六甲基二硅胺烷(HMDS)为原料CVD制备硅基纳米粉体的研究  

Preparation of Si-based Nano-powders from ((CH_3)_3Si)_2NH by CVD

作　　者：江东亮[1] 陆忠乾[1] 黄政仁[1] 严东生[1] 

机构地区：[1]中国科学院上海硅酸盐研究所,上海200050

出　　处：《无机材料学报》1997年第3期356-362,共7页Journal of Inorganic Materials

基　　金：国家攀登计划A"纳米材料科学"项目

摘　　要：以六甲基二硅胺烷作原料，用CVD法合成的纳米粉体，在1000～1500℃温度范围内合成的均属无定形，1000℃合成的纳米颗粒呈圆球形，粒径8～10nm，少量25～30nm．在1400℃高温下合成的颗粒较均匀，为8～10nm的圆球形．经高温晶化处理后，低温时合成的粉末呈晶须状，SiC和Si3N4相共存，以SiC相为主．较高温度下合成的粉体颗粒长大成20～40nm，以β-SiC相为主伴有α-SiC相，颗粒外表面有1～2nm的非晶层包裹，当在大气中存放三个月以后，则观测到原来品化的结构变成了无定形．Si-based nano-powders were prepared from ((CH3)3Si)2NH by CVD. The powders synthesizedat 1000-1500℃ were all amorphous. When the synthesizing temperature was 1000℃, the powders were near-spherical and had a particle-size of 8~10nm. When the synthesizing temperaturewas 1400℃, the powders were spherical and well-distributed, having a particle-size of 8~10nm.After crystallization at high temperatures, the powders synthesized at low temperatures becamewhisker mAlNly contAlNing SiC with small amount of St3N4, while the powders synthesized at hightemperatures became to 20~40nm particles mAlNly contAlNing　β-SiC with small amount of α-SiCand an amorphous surface-layer of 1~2nm. When exposed to air for three months, the crystallizedparticles became amorphous.

关 键 词：晶化 甲基二硅胺烷 纳米粉体 气相沉积 硅 

分 类 号：TQ127.2[化学工程—无机化工]