两步法合成正性光致抗蚀剂用酚醛树脂的研究  

Preparation of Novolac for Positive Photoresist Applications by Two-Step Synthesis Procedure

作　　者：宛盼盼[1] 佘亚萍[1] 吕兴军[1] 佘湘平[1] 熊莉娜[1] 

机构地区：[1]湖北省化学研究院,湖北武汉430074

出　　处：《化工技术与开发》2008年第6期4-7,共4页Technology & Development of Chemical Industry

摘　　要：第一步在甲醛过量的条件下合成2,6-双羟甲基对甲酚预聚体;第二步在无甲醛条件下,通过调节摩尔比、反应时间等实验条件,合成出结构交替的光致抗蚀剂用酚醛树脂。The first step was the synthesis of BHMpC prepolymer in excessive formaldehyde conditions. By adjusted the molar ratio and reaction time, the second step was the synthesis of novolac for photoresist use in formaldehyde-free conditions.

关 键 词：光致抗蚀剂 酚醛树脂 结构交替 

分 类 号：TQ323.1[化学工程—合成树脂塑料工业]