CMP设备控制软件的模块规划及可视化技术  

Module Planning and Visualization Technology of CMP Equipment Control Software

作　　者：姜培青 王永青[1] 康仁科[1] 郭东明[1] 

机构地区：[1]大连理工大学精密与特种加工教育部重点实验室,辽宁大连116024

出　　处：《电子工业专用设备》2008年第6期19-23,共5页Equipment for Electronic Products Manufacturing

基　　金：国家自然科学基金重大项目(基金号为.50390061);国家杰出青年基金(基金号为50325518)资助项目

摘　　要：CMP(Chemical Mechanical Polishing)设备是半导体集成电路(IC)制造中的关键设备,CMP设备控制软件的开发是CMP设备研发的关键技术之一。针对三工位CMP机床,自行设计开发了具有抛光压力在线监控、真空吸盘的真空度实时监测、抛光头及抛光盘变频电机转速和转向控制以及机床动作控制等功能的设备监控系统。采用面向对象的方法,给出了监控系统软件模块的划分方法,并对控制功能模块进行了类的封装,重点介绍了多视图通讯的实现以及利用OpenGL实现软件可视化的CMP软件开发关键技术。CMP （Chemical Mechanical Polishing）equipment is key to the semiconductor integrated circuit （IC） manufacturing, and the development of its control software is one of the key technologies in the research and development of CMP equipment. Monitoring system is proposed for three-plate machine, and that can monitor the on-line polishing pressure and the real-time vacuum degree of vacuum chuck, also can control speed and steering of frequency motor for polishing head and polishing plate and other actions of the machine. Object-oriented method is adopted to divide monitoring system software and encapsulate control function modules by means of class. The key technologies for CMP control software such as the realization of multi-view communications and the use of OpenGL to achieve visualization in software are analyzed in this paper.

关 键 词：CMP 面向对象 多视图通讯 OPENGL 

分 类 号：TN305.2[电子电信—物理电子学]