真空阴极电弧沉积法沉积类金刚石膜的研究  

STUDY ON THE PROCESS, PROPERTIES AND STRUCTURE OF DLC FILMS DEPOSITED BY VCAD METHOD

作　　者：袁镇海[1] 谢致薇[1] 罗广南[1] 邓其森[1] 郑健红[1] 戴达煌[1] 付志强[1] 

机构地区：[1]广州有色金属研究院,广州510651

出　　处：《广东有色金属学报》1997年第2期131-136,共6页Journal of Guangdong Non-Ferrous Metals

基　　金：中国有色金属工业总公司高新技术课题

摘　　要：克服了真空石墨电弧沉积过程中的一些难点,成功地利用真空阴极电弧沉积法制备了类金刚石膜,并对其表面形貌、硬度及结合强度、结构进行了分析,结果表明,真空阴极电弧沉积法是制备综合性能良好的光亮类金刚石膜的有效方法．类金刚石膜为非晶结构,具有明显的sp3结构特征．Some difficulties of vacuum graphite cathodic arc deposition have been overcome and DLC films have been successfully fabricated by means of VCAD method. Their surface morphology, hardness and adhesive strength, structure have also been studied. Re sults indicate that VCAD method is effective for preparing bright DLC films with excellent properties. DLC films are of amorphous structure and have obvious sp3 structural character istics.

关 键 词：真空阴极电弧沉积 类金刚石膜 

分 类 号：TN304.055[电子电信—物理电子学]