电化学微/纳加工分辨率的影响因素及对策  

On the Etching Revolution of Electrochemical Micro-(Nano-) Fabrication Technique-Its Limit and Solution

作　　者：祖延兵[1] 谢雷[1] 罗瑾[1] 毛秉伟[1] 田昭武[1] 

机构地区：[1]厦门大学化学系,厦门361005

出　　处：《物理化学学报》1997年第11期965-968,共4页Acta Physico-Chimica Sinica

基　　金：国家自然科学基金;国防科工委预研项目青年基金

摘　　要：The etching resolution of electrochemical fabrication technique is influenced significantly by the diffusion layer of the etchant. It has been shown that a fast etching rate can achieve higher etching resolution due to so-called heterogeneous scavenging effect, while a lower etching rate will result in rather lower etching resolution. For the latter case, the confined etchant layer technique(CELT) has been employed to improve the etching resolution. i. e., a certain redox couple which can consume the etchant homogeneously and rapidly was added to the solution. The homogeneous scavenging effect confined the etchant within a narrow layer around the electrode surface and much improved etching resolution was achieved. Using the CELT and a needle-shaped microelectrode, an etching spot of several micro-meters was obtained at silicon wafer surface.The etching resolution of electrochemical fabrication technique is influenced significantly by the diffusion layer of the etchant. It has been shown that a fast etching rate can achieve higher etching resolution due to so-called heterogeneous scavenging effect, while a lower etching rate will result in rather lower etching resolution. For the latter case, the confined etchant layer technique(CELT) has been employed to improve the etching resolution. i. e., a certain redox couple which can consume the etchant homogeneously and rapidly was added to the solution. The homogeneous scavenging effect confined the etchant within a narrow layer around the electrode surface and much improved etching resolution was achieved. Using the CELT and a needle-shaped microelectrode, an etching spot of several micro-meters was obtained at silicon wafer surface.

关 键 词：微米加工 纳米加工 硅 刻蚀 分辨率 SECM CELT 

分 类 号：TQ150.6[化学工程—电化学工业] TH－39[机械工程]