TbCo磁化膜制备工艺对其垂直磁各向异性的影响  

The Influence of TbCo Magnetic Film Preparation upon Its Perpendicular Magnetic Anisotropy

作　　者：章平[1] 黄致新[2] 王安福[1] 

机构地区：[1]郧阳师范高等专科学校物理系,湖北丹江口442700 [2]华中师范大学物理系,湖北武汉430079

出　　处：《郧阳师范高等专科学校学报》2008年第3期23-25,共3页Journal of Yunyang Teachers College

基　　金：湖北省教育厅资助项目(项目编号:D20086002)

摘　　要：利用磁控溅射法在玻璃基片制备TbCo非晶垂直磁化膜,采用样品振动磁强计和磁转矩测量仪测量薄膜的磁性能和磁转矩曲线.结果表明:Cr底层、TbCo磁性层组分、溅射气压、基片偏压、退火温度和TbCo磁性层厚度对薄膜的磁各向异性能都有很大影响.TbCo amorphous perpendicular magnetized film is prepared on glass substrat by way of magnetron sputtering and sample vibration magnetometer and magnetic torque instrument are used to determine film＇s magnetic property and torque curve. The result shows that Cr base, TbCo magnetic structure, sputtering pressure, substrat bias, annealing temperature and Tbco thickness all have great influence upon the film＇s magnetic anisotropy property.

关 键 词：TbCo薄膜 磁各向异性常数 磁控溅射 

分 类 号：TQ581[化学工程—精细化工]