关于CVD金刚石表面图形化的研究进展  

DEVELOPMENT OF STUDYING ON PATTERNING TECHNIQUES OF CVD DIAMOND FILMS

作　　者：满卫东[1] 谢鹏[1] 吴宇琼[2] 孙蕾[1] 汪建华[1] 

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,湖北武汉430073 [2]江汉大学化学与环境学院,湖北武汉430056

出　　处：《真空与低温》2008年第2期63-67,共5页Vacuum and Cryogenics

基　　金：国家自然科学基金(No:50572075)资助;湖北省教育厅Q20081505项目(2004)资助

摘　　要：金刚石膜是一种具有巨大应用潜力的新型功能材料, 但是它极高的硬度和良好的化学稳定性使其难以被加工成型, 因此如何对金刚石膜表面进行精确的图形化加工是实现制造金刚石器件的关键技术问题之一。系统地介绍了金刚石表面各种图形化的技术, 并且比较了它们的优缺点。CVD diamond is a promising functional material and has attracted increasing interest, but it is so extrahard and chemically stable that it is difficult to be etched and fabricated. Thus, the technique of morphologically machining CVD diamond is one of the key technique in realizing diamond devices manufacture. According to the practical requirement of diamond film, several patterning techniques of diamond film are described. The advantages and disadvantages of these techniques are analyzed.

关 键 词：金刚石 图形化 刻蚀 等离子体 

分 类 号：TB43[一般工业技术]