电化学模板法制备金属Ni纳米线阵列的研究  

The Research of Ni Nanowires Arrays Fabricated by AAO Template-Electrochemical Deposition Method

作　　者：韩萍[1] 宋国君[2] 徐思亭[1] 孙桂滨[1] 袁芳[1] 韩云海[1] 

机构地区：[1]青岛大学高等职业技术学院,山东青岛266071 [2]青岛大学化学化工与环境学院,山东青岛266071

出　　处：《青岛大学学报（工程技术版）》2008年第2期81-86,共6页Journal of Qingdao University(Engineering & Technology Edition)

摘　　要：采用电化学模板法在恒电位(-0.8V)下沉积10h成功制备了磁性金属Ni纳米线及其阵列结构。利用SEM、TEM、XRD对其微观形貌和晶体结构进行了表征,结果表明,纳米线阵列规整,排列紧密,纳米线长48μm,直径300nm,长径比160,阵列刚性较大,没有发生倒伏;制得的Ni纳米线具有多晶的面心立方结构,晶面指数为(111),(220),(200)。通过控制电沉积的时间,制备出不同长度的Ni纳米线,分析了电沉积时间对纳米线长度的影响。In this paper, Magnetic metal Ni nanowires arrays were successfully fabricated by AAO Tem- plate-electrochemical deposition method at the deposition voltage -0.8 V and the time duration of 10 h. Their microcosmic appearance and crystallizations were characterized by SEM, TEM and XRD technique. The followings are results： The Ni nanowires arrays were arranged in order and close. The length of the nanowires was 48μm, the diameters were 300 nm, and the rate of the length to the diameters was 160. The rigidity of arrays was larger, so the arrays did not fall. The structures of Ni nanowires arrays were face-centred cubic structures, and the index was （111）, （220）, （200）. Ni nanowires of different length can be fabricated by changing the time of direct current electrochemical deposition. The influence of the time of direct current electrochemical deposition to the length was analyzed.

关 键 词：电化沉积 模板法 镍纳米线 阵列 

分 类 号：TB383.1[一般工业技术—材料科学与工程]