激光扫描磁控溅射Fe/Si膜直接形成α-FeSi_2  

Direct formation of α-FeSi_2 from Fe/Si films prepared by magnetron sputtering using laser scan aealing

作　　者：张晋敏[1] 谢泉[1] 余平[1] 张勇[1] 肖清泉[1] 杨子义[1] 梁艳[1] 曾武贤[1] 

机构地区：[1]贵州大学电子科学与信息技术学院,贵州贵阳550025

出　　处：《功能材料》2008年第7期1087-1090,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(6056601);贵州省青年优秀人才培养计划资助项目(黔科合人20050528)

摘　　要：用直流磁控溅射方法分别在室温及不同温度的Si(100)衬底上沉积Fe膜,随后采用脉冲激光扫描进行退火,X射线衍射(XRD)和扫描电子显微镜(SEM)表征了激光扫描对薄膜结晶性质和表面显微结构的影响。测量结果证实直接形成了Fe-Si化合物系的富硅高温相-αFeSi2,室温沉积样品的结晶性质随激光能量密度的增加而提高;反应沉积样品的结晶性质随衬底温度升高而提高。Fe films were deposited on heating and non-heating Si（100） substrates by DC magnetron sputtering, subsequently were annealed by pulsed laser scanning with various laser energy densities. The crystal quality and the surface morphology of films were characterized by X-ray diffraction （XRD） and scanning electron microscopy （SEM）. The results showed direct formation of high temperature phase α-FeSi2 of compounds for Fe-Si system. The crystal quality was improved with increasing laser energy density for the films deposited at room temperature and with increasing substrates temperature for the films deposited on heating Si substrates.

关 键 词：磁控溅射 激光扫描退火 结晶性质 显微结构 

分 类 号：O484.1[理学—固体物理] O76[理学—物理]