基于扫描电子显微镜的集成电路显微拍摄系统  

Integrated Circuit Photomicrography System Based on SEM

作　　者：刘伟[1] 殷伯华[2] 

机构地区：[1]山东理工大学电气与电子工程学院,山东淄博255049 [2]中国科学院电工研究所,北京100080

出　　处：《微细加工技术》2008年第3期1-4,共4页Microfabrication Technology

摘　　要：提出使用扫描电子显微镜来获取集成电路芯片的形貌图像,以弥补光学显微镜分辨率的不足。利用拼接的方法来获得完整的芯片形貌图像。描述了压电陶瓷电机驱动工件台的工作原理。该工件台的定位误差小于20 nm,可使临近图像的重叠区域保持一致。介绍了使用电子束扫描控制器对电镜扫描场进行增益、旋转和位移校正的方法,使获得的芯片图像不需旋转即可进行拼接,减少了后续图像处理软件的工作量。实验证明,该系统可以获得亚微米级芯片的清晰图像。To exceed the limiting resolution of optical microscope, a photomicrography system based on scanning electron microscope was developed to acquire image of integrated circuit. The whole pattern of IC chip was obtained by stitching those small images. The operating principle of piezoelectric stage was described. An overlap range between neighborhood images was similar because positioning error of this stage was less than 20 nm. The method to correct gain, rotation, and orthogonality of scanning field by electron beam controller was explained. The obtained images can be stitched together directly without rotation. So the succeeding software identify task will perform more quickly and mistake happening probability will be decreased. Plainly discernible submicron images are acquired by the system through experiments.

关 键 词：芯片显微拍摄 电子束控制器 压电陶瓷电机 

分 类 号：TN305.7[电子电信—物理电子学]