PECVD系统的等离子体诊断及DLC膜的结构和性能研究  

Plasma diagnosis to PECVD system and structure/properties of DLC films

作　　者：楚信谱[1] 苟伟[1] 李剑锋[2] 张礼平[1] 吕世功[1] 李国卿[1] 

机构地区：[1]大连理工大学三束材料改性国家重点实验室,辽宁大连116024 [2]大连交通大学,辽宁大连116028

出　　处：《真空》2008年第5期31-34,共4页Vacuum

摘　　要：类金刚石碳膜以其优异的性能,诸如高电阻率、高硬度、低摩擦系数、良好的光学特性等显示出良好的应用前景,越来越受到人们的关注。本文首先利用朗谬耳探针对基底附近的等离子体特性进行了诊断,考察了离子电流密度与脉冲电压和工作气压的关系。然后在不同的气体比例下成功的制备出了DLC薄膜。采用拉曼光谱仪、原子力显微镜、纳米压痕仪等设备对薄膜的相结构、表面形貌和机械性能进行了综合分析,并研究了镀膜工艺与薄膜特性的关系。DLC （diamond-like carbon） films have good prospects in application because of their excellent performance, such as high resistivity and hardness and low coefficient of friction especially the favorable optical properties. The Langmuir probe was used to diagnose the plasma characteristics in the vicinity of substrate to investigate the relationship between the ion current density, pulse voltage and working pressure. Then, the DLC films were successfully prepared by Impulse Discharge PECVD under different gases in proportion. And the phase structure, surface morphology and mechanical properties of the films were analyzed by Raman spectroscopy, SEM, AFM and nano-indenter, as well as the relationship between deposition process and film characteristics.

关 键 词：等离子体诊断 PECVD DLC膜 RAMAN光谱 表面形貌 

分 类 号：O484.4[理学—固体物理]