A Novel 4T nMOS-Only SRAM Cell in 32nm Technology Node  

一种全nMOS SOI晶体管4管静态存储器单元(英文)

作　　者：张万成[1] 吴南健[1] 

机构地区：[1]中国科学院半导体研究所半导体超晶格国家重点实验室,北京100083

出　　处：《Journal of Semiconductors》2008年第10期1917-1921,共5页半导体学报（英文版）

基　　金：国家自然科学基金(批准号:90607007);国家重点基础研究发展规划(批准号:2006CB921201)资助项目~~

摘　　要：This paper proposes a novel loadless 4T SRAM cell composed of nMOS transistors. The SRAM cell is based on 32nm silicon-on-insulator （SO1） technology node. It consists of two access transistors and two pull-down transistors. The pull-down transistors have larger channel length than the access transistors. Due to the significant short channel effect of small-size MOS transistors, the access transistors have much larger leakage current than the pull-down transistors,enabling the SRAM cell to maintain logic ＂1＂ while in standby. The storage node voltages of the cell are fed back to the back-gates of the access transistors,enabling the stable ＂read＂ operation of the cell. The use of back-gate feedback also helps to im- prove the static noise margin （SNM） of the cell. The proposed SRAM cell has smaller area than conventional bulk 6T SRAM cells and 4T SRAM cells. The speed and power dissipation of the SRAM cell are simulated and discussed. The SRAM cell can operate with a 0. 5V supply voltage.提出了一种新颖的无负载4管全部由nMOS管组成的随机静态存储器(SRAM)单元.该SRAM单元基于32nm绝缘体上硅(SOI)工艺结点,它包含有两个存取管和两个下拉管.存取管的沟道长度小于下拉管的沟道长度.由于小尺寸MOS管的短沟道效应,在关闭状态时存取管具有远大于下拉管的漏电流,从而使SRAM单元在保持状态下可以维持逻辑"1".存储节点的电压还被反馈到存取管的背栅上,使SRAM单元具有稳定的"读"操作.背栅反馈同时增强了SRAM单元的静态噪声容限(SNM).该单元比传统的6管SRAM单元和4管SRAM单元具有更小的面积.对SRAM单元的读写速度和功耗做了仿真和讨论.该SRAM单元可以工作在0.5V电源电压下.

关 键 词：SRAM cell SOI 4T-SRAM 32nm technology node 

分 类 号：TP333[自动化与计算机技术—计算机系统结构]