热压印技术制作纳米光栅  

Hot Embossing for Nano-grating

作　　者：熊瑛[1] 刘刚[1] 田扬超[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《微细加工技术》2008年第4期25-26,31,共3页Microfabrication Technology

摘　　要：通过分析脱模过程的摩擦力,讨论了模具表面处理工艺与压模质量的关系,给出了降低脱膜过程摩擦力的工艺方法。实验结果表明,用类聚四氟乙烯膜作为脱模剂能大大减小模具表面与聚合物表面的摩擦力。研究了压模、脱模工艺参数对实验结果的影响,基于HEX-02塑铸系统,真空条件下,在压模温度为195℃,模压压强为8 MPa的环境下,利用热压印技术在PMMA薄膜上复制出周期为120 nm的纳米光栅。Hot embossing technology is one of the key technologies for mass copying the microstructure. Based on the analysis of demolding process, the relationship between the quality of replica and the surface modification process of mold insert was investigated and the process that can reduce the friction force was introduced. The result shows that it is effective to reduce greatly friction force between the surface of polymer replica and the surface of mold insert by using PTFE film as mold release agent. Based on the optimized demolding process parameters, the PMMA nano-grating replica with the period of 1：20 nm was obtained by using the HEX-02 hot embossing system at the temperature of 195℃ ,molding pressure of 8 MPa.

关 键 词：纳米光栅 热压印技术 PMMA 

分 类 号：TN405[电子电信—微电子学与固体电子学]